Translation guide
ALD is an abbreviation for Atomic Layer Deposition, a thin-film deposition technique. This guide covers how to refer to ALD in Japanese, including the full term, the abbreviation, and related expressions.
To refer to the thin-film deposition method itself in technical or academic contexts.
This is the standard Japanese translation of 'Atomic Layer Deposition'. It is used in technical papers, patents, and formal presentations.
原子層堆積は半導体製造に広く使われている。
Atomic layer deposition is widely used in semiconductor manufacturing.
The English abbreviation 'ALD' is commonly used in Japanese technical contexts, often pronounced as エーエルディー. It is understood by specialists.
To explain what ALD stands for when the abbreviation appears in general conversation or writing.
If the listener may not know the abbreviation, it's best to say the full Japanese term first, then mention the abbreviation. For example: 原子層堆積（ALD）.
ALDとは原子層堆積の略です。
ALD stands for Atomic Layer Deposition.
In Japanese, ALD is typically pronounced as エーエルディー (ē eru dī), using English letter names. Avoid spelling it out in katakana as アルド, which is not standard.
ALDは高い均一性を実現できる。
ALD can achieve high uniformity.
Adding 法 (method) explicitly marks it as a technique. This is also common in formal writing.
原子層堆積法により薄膜を形成した。
A thin film was formed by the atomic layer deposition method.