noun
lithography equipment; exposure system
Technical term used in semiconductor manufacturing and computing contexts; refers to the machine that projects circuit patterns onto wafers.
この工場では最新の露光装置が導入された。
The latest lithography equipment was introduced in this factory.
露光装置の精度がチップの性能を左右する。
The precision of the exposure system determines the chip's performance.
リソグラフィ is the general process of lithography, while 露光装置 specifically refers to the equipment used for exposure in that process.
Compound of 露光 (exposure to light) and 装置 (equipment, device).